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Selecting the geometry of a halogenide antireflection grating profile with regard for the etching technology capabilities
- Authors: Orekhova Y.A.1, Moiseev O.Y.2, Golovashkin D.L.2
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Affiliations:
- S.P. Korolyov Samara State Aerospace University
- Image Processing Systems Institute of the RAS
- Issue: Vol 7, No 2 (2008)
- Pages: 112-116
- Section: CONTROL, COMPUTER SCIENCE AND INFORMATION SCIENCE
- URL: https://journals.ssau.ru/vestnik/article/view/580
- DOI: https://doi.org/10.18287/2541-7533-2008-0-2(15)-112-116
- ID: 580
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Abstract
This work studies the propagation of middle IR laser radiation through an antireflection relief fabricated on the optical surface (made of silver halogenide). A new technology of microrelief fabrication that allows its antireflection properties to be enhanced is proposed.
About the authors
Yu. A. Orekhova
S.P. Korolyov Samara State Aerospace University
Author for correspondence.
Email: vest@ssau.ru
Russian Federation
O. Yu. Moiseev
Image Processing Systems Institute of the RAS
Email: vest@ssau.ru
Russian Federation
D. L. Golovashkin
Image Processing Systems Institute of the RAS
Email: vest@ssau.ru
Russian Federation
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